skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Two-dimensional fluid model of high density inductively coupled plasma sources

Journal Article · · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena
DOI:https://doi.org/10.1116/1.587102· OSTI ID:121624
;  [1];  [2]
  1. Univ. California, Berkeley, CA (United States)
  2. Lawrence Livermore Lab., CA (United States)

A two-dimensional (r,z) fluid model has been developed to study plasma transport in inductively coupled plasmas (ICP). Electron heating is treated by assuming a fixed, spatially varing power deposition profile in the electron energy balance equation. A high aspect ration ICP reactor geometry has been studied, with two assumed power profiles: spatially uniform and localized to within several skin depths of the radial wall. The effect of neutral gas pressure on plasma uniformity is presented for an argon discharge over the range of 1-20 mTorr. Comparisons between the fluid model and predictions from a spatially averaged global model show similar scaling of plasma density, electron temperature, and plasma potential over a wide range of pressure and power. 20 refs., 10 figs., 1 tab.

Sponsoring Organization:
USDOE
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
121624
Journal Information:
Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Vol. 12, Issue 1; Other Information: PBD: Jan-Feb 1994
Country of Publication:
United States
Language:
English