X-ray Microdiffraction from α-Ti0.04Fe1.96O3 (0001) Epitaxial Film Grown Over α-Cr2O3 Buffer Layer Boundary
Ti-doped hematite (α-Ti0.04Fe1.96O3) film grown over patterned α-Cr2O3 buffer layer on α-Al2O3(0001) substrate was characterized with synchrotron X-ray microdiffraction. The film was grown by oxygen plasma assisted molecular beam epitaxy method. The film growth mode was correlated to buffer layer boundary and Ti concentration variation. Epitaxial α-Ti0.04Fe1.96O3 film was formed on bare substrate adjacent to the buffer layer. The epitaxial film was connected laterally to a strain-relaxed epitaxial α-Ti0.04Fe1.96O3 film grown on the buffer layer. On bare α-Al2O3 substrate with diminished Ti concentration only a small portion of α-TixFe1-xO3 film was epitaxial either as coherent to the substrate or strain-relaxed form.
- Research Organization:
- Pacific Northwest National Lab. (PNNL), Richland, WA (United States). Environmental Molecular Sciences Lab. (EMSL)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC05-76RL01830
- OSTI ID:
- 1026595
- Journal Information:
- Thin Solid Films, Vol. 519, Issue 18; ISSN 0040-6090
- Publisher:
- Elsevier
- Country of Publication:
- United States
- Language:
- English
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