Reflective optical imaging system for extreme ultraviolet wavelengths
Patent Application
·
OSTI ID:10167253
This invention is comprised of a projection reflection optical system having two mirrors in a coaxial, four reflection configuration to reproduce the image of an object. The mirrors have aspherical reflection surfaces to provide a very high resolution of object feature wavelengths less than 200 {mu}m, and preferably less than 100 {mu}m. An image resolution of features less than 0.05--0.1 {mu}m, is obtained over a large area field; i.e., 25.4 mm {times} 25.4 mm, with a distortion less than 0.1 of the resolution over the image field.
- Research Organization:
- Los Alamos National Lab., NM (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-36
- Assignee:
- Dept. of Energy
- Patent Number(s):
- PATENTS-US-A7682780
- Application Number:
- ON: DE93015886; PAN: 7-682,780
- OSTI ID:
- 10167253
- Resource Relation:
- Other Information: PBD: 1991
- Country of Publication:
- United States
- Language:
- English
Similar Records
Reflective optical imaging system for extreme ultraviolet wavelengths
Reflective optical imaging system for extreme ultraviolet wavelengths
Development of reflective optical systems for XUV projection lithography
Patent
·
Tue May 18 00:00:00 EDT 1993
·
OSTI ID:10167253
Reflective optical imaging system for extreme ultraviolet wavelengths
Patent
·
Fri Jan 01 00:00:00 EST 1993
·
OSTI ID:10167253
Development of reflective optical systems for XUV projection lithography
Conference
·
Tue Jan 01 00:00:00 EST 1991
·
OSTI ID:10167253