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Title: Bonding of hydrogen implanted at 80K into III-IV semiconductors

Conference ·
OSTI ID:10107788

Hydrogen implantation at 80K is shown to introduce As-H centers in GaAs and InAs, and P-H centers in InP. These As(P)-H centers anneal between 150 and 300K. By analogy to suggested defect assignments in electron-irradiated GaAs, it is suggested that the sites for the As(P)-H centers are metastable defects such as close vacancy-interstitial pairs. In contrast to GaAs, where absorption by Ga-H centers increases upon loss of As-H, no absorption attributable to In-H was observed in either InAs or InP. Hydrogen in an As vacancy is the suggested model for Ga-H centers. If such vacancies are thermally unstable in In-based compounds, it would explain an absence of In-H bonds and may reduce the capability for ion implantation to produce electrical isolation in In-based compound semiconductors. 19 refs., 6 figs.

Research Organization:
Sandia National Labs., Albuquerque, NM (United States)
Sponsoring Organization:
USDOE, Washington, DC (United States)
DOE Contract Number:
AC04-76DP00789
OSTI ID:
10107788
Report Number(s):
SAND-91-1477C; CONF-911202-6; ON: DE92004354
Resource Relation:
Conference: Annual fall meeting of the Materials Research Society (MRS),Boston, MA (United States),2-6 Dec 1991; Other Information: PBD: [1991]
Country of Publication:
United States
Language:
English