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Title: Creep in protective {alpha}-Al{sub 2}O{sub 3} thermally grown on {beta}-NiAl.

Journal Article · · Appl. Phys. Lett.
DOI:https://doi.org/10.1063/1.2715105· OSTI ID:1000657

The authors report systematic measurements of creep relaxation in {alpha}-Al{sub 2}O{sub 3}, thermally grown in air on (100) single crystals of stoichiometric {beta}-NiAl, at temperatures between 950 and 1100 C. Creep was monitored using time dependent in situ measurements of strain relaxation in the oxide following imposition of a stress resulting from a sudden temperature change. The in-plane elastic strain was obtained using a sin{sup 2} {psi} x-ray diffraction technique exploiting synchrotron radiation. The authors found that strain relaxation rates were comparable to those observed in fine grained {alpha}-Al{sub 2}O{sub 3} ceramics when the latter results were extrapolated to the lower temperatures examined here. Creep rates at stress levels of 100 MPa, or less, are proportional to {sigma}{sup n}, with n - 2, consistent with a diffusional creep mechanism.

Research Organization:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Organization:
USDOE Office of Science (SC)
DOE Contract Number:
DE-AC02-06CH11357
OSTI ID:
1000657
Report Number(s):
ANL/MSD/JA-57771; TRN: US1100159
Journal Information:
Appl. Phys. Lett., Vol. 90, Issue Mar. 2007
Country of Publication:
United States
Language:
ENGLISH